brief patent analysis

  • Micro light-emitting diode display panel and manufacturing method therefor (US20220344315A1);

  • Method of depositing epitaxial material, structure formed using the method, and system for performing the method (KR20210117163A);

  • Preparation method for improving crystal quality of large-size thick film silicon epitaxial wafer (CN116288707A).

So what? in Russia?

In the FIPS database, search for the query “hydrogen chloride H01L» 13 Russian patents for inventions were found, of which only 1 is valid: No.2805132 on a method for manufacturing a semiconductor device (A.A. Kadyrov Chechen State University).

Institute of Ultrahigh-Frequency Semiconductor Electronics named after V.G. Mokerova RAS has patent No.2731167 for a method of laser plasma-chemical cutting of plates, which has ceased to operate, but can be restored (the duty has not been paid).

There are no applications for inventions.

There are no Russian patents for utility models in our field.

No computer programs, databases or integrated circuit topologies were found.

Hydrogen chloride in Russian electronics

The terms “hydrogen chloride electronics” and “hydrogen chloride electronics” are listed on the government procurement portal for 2014-2024. zero purchases. By hydrogen chloride semiconductor 1 purchase: in 2014, Institute of Semiconductor Physics named after. A.V. Rzhanova SB RAS purchased chemical reagents for 200 thousand rubles, including “Hydrochloric acid of high purity 26-4 according to GOST 14261-77.”

Domain “Science and Innovation” by “hydrogen chloride electronics” indicates for only one result of intellectual activity – “Obtaining high-purity hydrogen chloride for electronics by plasma-chemical hydrogenation of silicon tetrachloride waste.” Know-how relates to the production of high-purity hydrogen chloride in the production of microchips and other electronic devices (Nizhny Novgorod State Technical University named after R.E. Alekseev, order No. 615 of December 13, 2023).

The same database on “hydrogen chloride semiconductor” provides 1 document: information about research work from 2017 “Development of highly selective catalytic systems for the implementation of an energy-efficient process for obtaining germanium from tetrachlorogermane” (Nizhny Novgorod State Technical University named after R.E. Alekseev), which has indirectly related to microelectronics.

Conclusion

The primary use of hydrogen chloride in the manufacture of precision electronic components is in cleaning and etching processes. Before assembling semiconductor devices, the surfaces of components must be cleaned of contaminants and oxides. Hydrogen chloride is used in particular to remove contaminants and oxide layers from silicon and metal surfaces, providing a clean and smooth surface for subsequent processes, ensuring optimal performance of electronic components.

In the Russian Federation, only a few organizations have some competence in this area, for example, Hermes-gaz LLC supplies cylinders with electronic purity hydrogen chloride throughout Russia, Kazakhstan, Uzbekistan, Georgia and Armenia.

The patent situation in Russia is unsatisfactory, inventive activity is weak and, most importantly, research funding is negligible. In this area, we are lagging behind not only advanced countries in microelectronics (Japan, USA, South Korea, Taiwan), but also from China.

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